The crack propagation behavior in the deposited TITANIUM/TITANIUM NITRIDE bilayer is compared with the perfect structure using the molecular dynamics method. For this purpose, TITANIUM NITRIDE was deposited on the TITANIUM substrate, then crack growth was investigated in the two structures. The TITANIUM NITRIDE film growth on the TITANIUM substrate was an island, and the structure has defects and residual stress. The results showed that both the biaxial and normal stresses in the substrate and film are tensile and compressive, respectively. The cohesive energy of the interface was calculated by energy difference along with the atomic layers. In the following, a crack was considered perpendicular to the TITANIUM/TITANIUM NITRIDE interface in both models, with an initial length of 15 Å. Due to the brittle behavior of the ceramic layer, the crack propagates rapidly until interface. The plastic deformation of the TITANIUM layer and the structure of the interface blunt the tip of the crack and prevent it to fail. Also, the critical stress for crack growth in a perfect structure is found to 2.5 times its value in the deposited structure because of defects and residual stress.

In orthopedics, the drilling process is one of the most important steps in the preparation of medical tools and implants. Improving the performance of medical tools and implants is of great importance, because these tools and implants are used in the repair of bone and joint injuries. One of the ways to improve the efficiency of these tools and implants is to use TITANIUM NITRIDE nano coatings on drilling tools. This article is presented with the aim of experimental analysis and optimization of axial force in the orthopedic drilling process using a tool coated with TITANIUM NITRIDE nano coating by physical deposition method. The purpose of this research is to improve the performance and efficiency of this process by optimizing various parameters such as tool rotation speed, cutting depth and TITANIUM NITRIDE coating. For this purpose, experimental tests were conducted using the response surface method. the sensitivity analysis was also performed. The results have shown that the rotational speed, as the most effective parameter, has a lesser effect (45% effect) on the axial force in the case without nanocoating, while it shows a greater effect (73% effect) in the case with nanocoating.

In this paper, we reviewed researches about the TITANIUM NITRIDE (TiN) and TITANIUM carbide (TiC) single and multilayer coatings. These coatings were deposited by the plasma assisted chemical vapor deposition (PACVD) technique. Plasma-based technologies are used for the processing of thin films and coatings for different applications such as automobile and aerospace parts, computer disc drives, food industry and surgical/medical instruments. We describe the state of the performance of different coating systems and thin film architectures in PACVD suitable for industrial-scale or laboratory applications. Mechanical properties of coatings such as wear resistance, hardness and the scratch resistance, structural characteristics, physical and chemical properties like coatings adhesion into different substrates, wetting behavior and corrosion resistance were studied. Thus, this paper represents a source of information for those who want to familiarize with the status of knowledge in the area of materials science of functional coatings, in particular TiN/TiC coatings that was deposited by a new Plasma-based technologies.

The transition metal NITRIDEs like TITANIUM NITRIDE exhibit very interesting color variation properties depending on the different plasma deposition conditions using cylindrical magnetron sputtering method. It is found in this deposition study that nitrogen partial pressure in the reactive gas discharge environment plays a significant role on the color variation of the film coatings on bell-metal which is commercially used for decorative as well as for a variety of industrial applications. UV-visible spectrophotometer spectra show that good film coatings has been deposited at argon: nitrogen gas partial pressure of 1: 1. Magnetic field and the deposition time also play an important role in the color variation of the deposited TITANIUM NITRIDE film.

In this study, graphitic carbon NITRIDE (g-C3N4) was made by thermal condensation of melamine at 450 and 550 ° C. Moreover, the TiO2 porous nanostructured electrode as a substrate for the g-C3N4 deposition was fabricated by anodization method on a TITANIUM foil (Ti) and then, reduced by electrochemical method to improve electrical conductivity (Re-TiO2 NP). The graphite carbon NITRIDE layers were deposited on the porous nanostructured electrode (Re-TiO2 NP/Ti) by electrophoretic technique and the g-C3N4/Re-TiO2 NP/Ti electrodes were used as supercapacitor electrode. Comparison of the supercapacitive properties of the synthesized electrodes showed that the electrochemical efficiency and specific capacitance of the g-C3N4 (450)/Re-TiO2 NP/Ti electrode is higher than the g-C3N4 (550)/Re-TiO2 NP/Ti electrode. This behavior was resulted from the increased active sites, the enhanced charge transport and hydrophilicity due to higher nitrogen content of the g-C3N4 (450)/Re-TiO2 NP/Ti electrode.

TiN thin films are prepared by the DC magnetron sputtering method, and the effect of post annealing treatment on the physical, structural, morphological, and optical properties of TiN layers are investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), and UV-VIS spectrophotometer. Variation of electrical resistivity and film’s hardness are also investigated. Based on the XRD results, increasing annealing temperature would not change film’s stoichiometry, but deteriorates improvement of the films crystalline quality. The as-deposited film with amorphous structure changes to a single-phase crystalline structure that has a preferred orientation along (111) and the polycrystalline structure at higher annealing temperatures. According to SEM images, a dense structure transforms to a denuded zone structure during annealing temperature. The reflectance of TiN films shows a minimum in the visible region indicating a significant increase in the infrared region. The optical band gap energy value increases by increasing the annealing temperature while, the electrical resistivity and hardness values decrease.

In this research, various types of NITRIDE additives were incorporated into TITANIUM diboride attaining dense TiB2-based ceramics by field-assisted sintering technique. The addition of different types of NITRIDE additives, namely Si3N4, BN, AlN, and TiN, significantly improved the sinterability of TiB2, achieving near fully dense ceramics. The X-ray diffraction analysis and microstructural evaluation confirmed the presence of the h-BN compound in all specimens. In the TiB2-Si3N4 ceramic, Si3N4 additive reacted with B2O3 oxide, in-situ generating h-BN, and SiO2 phases. Although the h-BN phase was produced in the TiB2-AlN specimen, the main proportion of AlN remained in the sample as an unreacted ex-situ phase. In terms of the TiB2-TiN ceramic, some of the nitrogen and boron atoms could leave the TiN and TiB2 crystalline structures, contributing to the in-situ formation of h-BN.